Antireflection sub-wavelength gratings fabricated by spin-coating replication

Y. Kanamori, E. Roy, Y. Chen

研究成果: Conference article査読

101 被引用数 (Scopus)


We fabricated an antireflection subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) by a spin-coating replication technique. Silicon molds of a two-dimensional tapered grating of 200 nm period and 90 nm deep have been obtained using electron beam lithography and reactive ion etching. Replication has been done by direct spin-coating a 9.35 μm thick PMMA on the mold, followed by an appropriate mounting on a glass substrate. The transmittance in the wavelength region ranging from 500 to 800 nm was measured and compared with the calculation results on the basis of rigorous coupled-wave analysis. At these wavelengths, the transmittance of the SWG was increased in comparison with that of the flat PMMA sheet, in good agreement with the theoretical calculations.

ジャーナルMicroelectronic Engineering
出版ステータスPublished - 2005 3
イベントProceedings of the 30th International Conference on Micro- and Nano-Engineering -
継続期間: 2004 9 192004 9 22

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学


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