Antireflection sub-wavelength gratings fabricated by spin-coating replication

Y. Kanamori, E. Roy, Y. Chen

研究成果: Conference article査読

101 被引用数 (Scopus)

抄録

We fabricated an antireflection subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) by a spin-coating replication technique. Silicon molds of a two-dimensional tapered grating of 200 nm period and 90 nm deep have been obtained using electron beam lithography and reactive ion etching. Replication has been done by direct spin-coating a 9.35 μm thick PMMA on the mold, followed by an appropriate mounting on a glass substrate. The transmittance in the wavelength region ranging from 500 to 800 nm was measured and compared with the calculation results on the basis of rigorous coupled-wave analysis. At these wavelengths, the transmittance of the SWG was increased in comparison with that of the flat PMMA sheet, in good agreement with the theoretical calculations.

本文言語English
ページ(範囲)287-293
ページ数7
ジャーナルMicroelectronic Engineering
78-79
1-4
DOI
出版ステータスPublished - 2005 3
イベントProceedings of the 30th International Conference on Micro- and Nano-Engineering -
継続期間: 2004 9 192004 9 22

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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