Annealing Behavior of Vacancy-Type Defects in Mg- and H-Implanted GaN Studied Using Monoenergetic Positron Beams

Akira Uedono, Hiroko Iguchi, Tetsuo Narita, Keita Kataoka, Werner Egger, Tönjes Koschine, Christoph Hugenschmidt, Marcel Dickmann, Kohei Shima, Kazunobu Kojima, Shigefusa F. Chichibu, Shoji Ishibashi

研究成果: Article査読

21 被引用数 (Scopus)

抄録

Vacancy-type defects in Mg-implanted GaN with and without hydrogen (H) implantation are probed by using monoenergetic positron beams. Mg+ and H+ ions are implanted into GaN(000 (Formula presented.)) to obtain 0.1 and 0.7-µm-deep box profiles with Mg and H concentrations of 1 × 1019 and 2 × 1020 cm−3, respectively. For the as-implanted samples, the major defect species is determined to be Ga-vacancy (VGa) related defects such as VGa, divacancy (VGaVN), and their complexes with impurities. For Mg-implanted samples, an agglomeration of vacancies starts at 800 °C annealing, leading to the formation of vacancy clusters such as (VGaVN)3. For the samples annealed above 1000 °C, the trapping rate of positrons by vacancies is increased by illumination of a He–Cd laser. This is attributed to the capture of photon-excited electrons by the defects and their charge transition. For Mg- and H-implanted samples, the hydrogenation of vacancy-type defects starts after 800 °C annealing. Comparing with the annealing behavior of defects for the samples without H-implantation, the clustering of vacancy-type defects is suppressed, which can be attributed to the interaction between Mg, H, and vacancies.

本文言語English
論文番号1900104
ジャーナルPhysica Status Solidi (B) Basic Research
256
10
DOI
出版ステータスPublished - 2019 10月 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

フィンガープリント

「Annealing Behavior of Vacancy-Type Defects in Mg- and H-Implanted GaN Studied Using Monoenergetic Positron Beams」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル