Anisotropy of the spin-orbit branching ratio in angle-resolved photoemission from adsorbate layers

H. W. Yeom, T. Abukawa, Y. Takakuwa, S. Fujimori, T. Okane, Y. Ogura, T. Miura, S. Sato, A. Kakizaki, S. Kono

研究成果: Article査読

28 被引用数 (Scopus)

抄録

The angular variation of the spin-orbit branching ratio of In 4d photoemission doublets from ordered In overlayers on the Si(001) surface was investigated. The branching ratios show strong angular anisotropy in the investigated photon energy range of 70-100 eV, which depends both on the surface structure and the photon energy. It is demonstrated that the anisotropy in this energy range is caused by an inherent difference in the photoelectron waves of the 4d5/2 and 4d3/2 levels via photoelectron diffraction.

本文言語English
ページ(範囲)L236-L241
ジャーナルSurface Science
395
2-3
DOI
出版ステータスPublished - 1998 1月 12

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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