Anatase formation on titanium by two-step thermal oxidation

Takuro Okazumi, Kyosuke Ueda, Kazuki Tajima, Nobuyuki Umetsu, Takayuki Narushima

研究成果: Article査読

18 被引用数 (Scopus)

抄録

Two-step thermal oxidation of commercially pure Ti was investigated with a focus on the formation of anatase. A first-step treatment was conducted in Ar-(0.1-20)%CO atmosphere at a temperature of 773-1173 K for a holding time of 0 or 86.4 ks, and a subsequent second-step treatment was conducted in air at 473-873 K for 0-86.4 ks. Titanium oxides and titanium oxycarbide were obtained in the first step, with relative amounts depending on heating temperature, holding time, and CO partial pressure. An anatase-rich layer on Ti was obtained after second-step treatment in air at 573-773 K in cases where single-phase titanium oxycarbide formed in the first step. Thus, the formation of single-phase titanium oxycarbide in the first step and temperature control in the second step were required for the formation of an anatase-rich layer. The bonding strength of an anatase-rich layer with a thickness of 0.5 μm was calculated to be around 90 MPa. This study reveals the conditions under which an anatase-rich layer with excellent adherence to Ti can be prepared by thermal oxidation.

本文言語English
ページ(範囲)2998-3005
ページ数8
ジャーナルJournal of Materials Science
46
9
DOI
出版ステータスPublished - 2011 5

ASJC Scopus subject areas

  • 材料科学(全般)
  • 材料力学
  • 機械工学

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