Analysis of the relaxation process of electron–hole pairs in α-Al2O3 using transient absorption spectroscopy

Masanori Koshimizu, Yusa Muroya, Shinichi Yamashita, Hiroki Yamamoto, Yutaka Fujimoto, Keisuke Asai

研究成果: Article査読

1 被引用数 (Scopus)

抄録

We measured transient absorption in α-Al2O3 after pulsed electron beam irradiation to analyze the relaxation process of excited states. We used two measurement systems to obtain transient absorption in nanosecond and picosecond time scales. In the nanosecond time scale, we observed a band at 610 nm in addition to a shoulder at 420 nm. This observation is consistent with that in a previous paper, and these bands are attributed to Al interstitials according to the paper. The decay behavior of these bands was significantly different in the picosecond time scale. The difference in the decay kinetics strongly suggests that the band at 610 nm and the shoulder at 420 nm are attributed to two kinds of Al interstitials.

本文言語English
ページ(範囲)7091-7094
ページ数4
ジャーナルJournal of Materials Science: Materials in Electronics
28
10
DOI
出版ステータスPublished - 2017 5 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 電子工学および電気工学

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