Analysis of gas convection and temperature distribution in a rotating wafer in a cylindrical lamp heating apparatus

Shigeki Hirasawa, Shigenao Maruyama

研究成果: Conference article査読

3 被引用数 (Scopus)

抄録

A three-dimensional radiation-heat-transfer analysis and a convection-heat-transfer analysis are combined in order to determine the temperature distribution in a rotating wafer in a cylindrical lamp heating apparatus for rapid thermal processing. The calculated results show that the temperature variation in the wafer increases 1.4 K by the effect of natural convection, when inlet gas velocity is 0.1 m/s during 1273 K steady-state heating of the non-rotating wafer. The effect of gas convection on the temperature variations in the wafer can be minimized when the wafer is rotating in an axisymmetric apparatus and the heating rates of the lamps are optimally controlled.

本文言語English
ページ(範囲)45-51
ページ数7
ジャーナルAmerican Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD
372
5
DOI
出版ステータスPublished - 2002 12 1
イベント2002 ASME International Mechanical Engineering Congress and Exposition - New Orleans, LA, United States
継続期間: 2002 11 172002 11 22

ASJC Scopus subject areas

  • Mechanical Engineering
  • Fluid Flow and Transfer Processes

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