Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group

K. Kato, T. Miyake, Y. Beppu, T. Tanii, I. Ohdomari

    研究成果: Conference contribution

    本文言語English
    ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
    ページ60-61
    ページ数2
    DOI
    出版ステータスPublished - 2007
    イベントs20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
    継続期間: 2007 11 52007 11 8

    出版物シリーズ

    名前Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

    Other

    Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
    CountryJapan
    CityKyoto
    Period07/11/507/11/8

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering

    引用スタイル