TY - JOUR
T1 - An electrostatic-discharge (ESD) protection device with low parasitic capacitance utilizing a depletion-layer-extended transistor (DET) for RF CMOS ICs
AU - Ohnakado, Takahiro
AU - Yamakawa, Satoshi
AU - Furukawa, Akihiko
AU - Nishikawa, Kazuyasu
AU - Murakami, Takaaki
AU - Hashizume, Yasushi
AU - Sugahara, Kazuyuki
AU - Tomisawa, Jun
AU - Suematsu, Noriharu
AU - Oomori, Tatsuo
PY - 2003/4
Y1 - 2003/4
N2 - In this paper, an electrostatic-discharge (ESD) protection device for RF complementary metal oxide semiconductor (CMOS) ICs utilizing the Depletion-layer-Extended Transistor (DET) is reported. The DET, which reduces the area component of junction capacitance by about 1/3, realizes an ESD protection device with low parasitic capacitance. With transmission line pulse (TLP) testing, the DET demonstrates about the same or higher ESD robustness than the conventional transistor. The junction capacitance of the proposed device for obtaining a failure current (It2) of 1-1.33 A in TLP testing, corresponding to a Human Body Model (HBM) tolerance of 2 kV, is estimated to be very low, less than 150 fF. The proposed ESD protection device is very promising for the realization of high-performance and highly reliable RF CMOS ICs.
AB - In this paper, an electrostatic-discharge (ESD) protection device for RF complementary metal oxide semiconductor (CMOS) ICs utilizing the Depletion-layer-Extended Transistor (DET) is reported. The DET, which reduces the area component of junction capacitance by about 1/3, realizes an ESD protection device with low parasitic capacitance. With transmission line pulse (TLP) testing, the DET demonstrates about the same or higher ESD robustness than the conventional transistor. The junction capacitance of the proposed device for obtaining a failure current (It2) of 1-1.33 A in TLP testing, corresponding to a Human Body Model (HBM) tolerance of 2 kV, is estimated to be very low, less than 150 fF. The proposed ESD protection device is very promising for the realization of high-performance and highly reliable RF CMOS ICs.
KW - CMOS
KW - Depletion layer
KW - ESD
KW - Junction capacitance
KW - Parasitic capacitance
KW - RF
KW - TLP
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U2 - 10.1143/jjap.42.2077
DO - 10.1143/jjap.42.2077
M3 - Article
AN - SCOPUS:0038348006
VL - 42
SP - 2077
EP - 2081
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 4 B
ER -