Amorphous silicon structure of heat-treated poly(n-propylsilyne) studied by far-infrared spectroscopy

A. Watanabe, Y. Nagai, M. Matsuda, M. Suezawa, K. Sumino

研究成果: Article査読

14 被引用数 (Scopus)

抄録

The formation of amorphous silicon using a silicon network polymer as a precursor was investigated. Poly(n-propylsilyne), which has a silicon network structure, was heat-treated in vacuo. The organic side group of poly(n-propylsilyne) disappeared completely and the optical band gap Eg,opt decreased from 2.91 to 1.29 eV by heat-treatment at 400°C. The heat-treated poly(n-propylsilyne) showed a far-infared absorption spectrum similar to amorphous silicon.

本文言語English
ページ(範囲)132-136
ページ数5
ジャーナルChemical Physics Letters
207
2-3
DOI
出版ステータスPublished - 1993 5月 21

ASJC Scopus subject areas

  • 物理学および天文学(全般)
  • 物理化学および理論化学

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