Adsorption and desorption processes of self-assembled monolayers studied by surface-sensitive microscopy and spectroscopy

Masahiko Hara, Kaoru Tamada, Christian Hahn, Naoki Nishida, Wolfgang Knoll

研究成果: Article査読

13 被引用数 (Scopus)

抄録

Adsorption and desorption processes of self-assembled monolayers (SAMs) have been studied on an Au(111) surface by scanning tunnelling microscopy (STM), atomic force microscopy (AFM). X-ray photo-electron spectroscopy (XPS) and thermal desorption spectroscopy (TDS). At the initial growth stage, the ordered nucleation of SAM located at the herringbone turns of the Au(111)-(22×√3) surface reconstruction and diffusion-controlled domain formation have been imaged by STM and AFM. Details of the oxidation process in UV desorption were also investigated by XPS. In addition, the dimerization reaction during desorption was confirmed by TDS for the first time in the alkanethiol SAM system.

本文言語English
ページ(範囲)103-109
ページ数7
ジャーナルSupramolecular Science
3
1-3
DOI
出版ステータスPublished - 1996
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)

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