A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions

Daisuke Watanabe, Hitoshi Kubota, Yasuo Ando, Terunobu Miyazaki

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicronsized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.

本文言語English
ページ(範囲)7489-7490
ページ数2
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
43
11 A
DOI
出版ステータスPublished - 2004 11 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント 「A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル