A-SiC:H/SiO2 Laminated Polarization Splitter for the Wavelength Region Longer Than 1.3 μm Prepared by Plasma-Enhanced Chemical Vapor Deposition

Osamu Hanaizumi, Yong Gi Lee, Isao Takahashi, Tomohiko Nakajo, Jun Ichi Murota, Shojiro Kawakami

研究成果: Article査読

3 被引用数 (Scopus)

抄録

A laminated polarization splitter for the wavelength region longer than 1.3 μm is fabricated for the first time. It is composed of a-SiC:H/SiO2 alternative multilayers prepared by plasma-enhanced chemical vapor deposition. Splitting behavior is also verified experimentally. It has low absorption loss even for the wavelength region around λ = 1.3 μm because the band-gap energy of a-Sic is larger than that of a-Si. The measured splitting angle is 13.8°, which is 2.4 times larger than the 5.7° splitting angle of rutile. The absorption loss of the multilayer is reduced to 1 × 10-3 dB/μm at λ = 1.3 μm. The magnitude of the residual stress is 9.45 × 108 dyn/cm2, which is about one-third of that prepared by the rf bias sputtering equipment which is used for another project of our group. The deposition rate of SiO2, is increased to 135 nm/min, which is 27 times larger than that prepared by the sputtering equipment.

本文言語English
ページ(範囲)359-362
ページ数4
ジャーナルOptical Fiber Technology
1
4
DOI
出版ステータスPublished - 1995 10月

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 制御およびシステム工学
  • 原子分子物理学および光学
  • 器械工学
  • 電子工学および電気工学

フィンガープリント

「A-SiC:H/SiO2 Laminated Polarization Splitter for the Wavelength Region Longer Than 1.3 μm Prepared by Plasma-Enhanced Chemical Vapor Deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル