A reflection-type vapor cell using anisotropic etching of silicon for micro atomic clocks

Hitoshi Nishino, Motoaki Hara, Yuichiro Yano, Masaya Toda, Yoshiaki Kanamori, Masatoshi Kajita, Tetsuya Ido, Takahito Ono

研究成果: Article › 査読

4 被引用数 (Scopus)

抄録

This paper reports the design, fabrication and evaluation of a reflection-type optical Rb vapor cell for chip-scale micro atomic clocks. To reduce the physical package height, the reflection-type vapor cell is developed, in which optical components can be mounted on one side of the vapor cell. A (100)-oriented Si wafer with a cut-off 9.74° toward [011] direction is used to make 45° mirrors by anisotropic wet etching. 90° mirrors are fabricated by Si deep reactive ion etching and surface planarization using H2 annealing. Following the detection of D1 optical absorption for Rb atoms, coherent population trapping resonance was observed.

本文言語English
論文番号072012
ジャーナルApplied Physics Express
巻12
号7
DOI
出版ステータスPublished - 2019 7 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

文献へのアクセス

フィンガープリント 「A reflection-type vapor cell using anisotropic etching of silicon for micro atomic clocks」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル