A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems

Akio Higo, K. Takahashi, H. Fujita, Y. Nakano, H. Toshiyoshi

    研究成果: Conference contribution

    2 被引用数 (Scopus)

    抄録

    We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.

    本文言語English
    ホスト出版物のタイトルTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
    ページ196-199
    ページ数4
    DOI
    出版ステータスPublished - 2009 12 11
    イベントTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems - Denver, CO, United States
    継続期間: 2009 6 212009 6 25

    出版物シリーズ

    名前TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

    Other

    OtherTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
    CountryUnited States
    CityDenver, CO
    Period09/6/2109/6/25

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering

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