A new silicon quantum-well structure with controlled diameter and thickness fabricated with ferritin iron core mask and chlorine neutral beam etching

Seiji Samukawa, Tomohiro Kubota, Chi Hsien Huang, Takeshi Hashimoto, Makoto Igarashi, Kensuke Nishioka, Masaki Takeguchi, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita

研究成果: Article査読

9 被引用数 (Scopus)

抄録

A disk-shaped silicon nanostructure, which works as a quantum well, was fabricated by etching a polycrystalline siIicon/SiO2/silicon wafer with a chlorine neutral beam. The diameter (about 8 to 10 nm) and thickness (about 2 to 4 nm) of the nanodisk were controlled by changing the surface-oxide-removal conditions and deposition thickness of poly-silicon. Current-voltage measurements of the nanodisk showed staircase characteristics at room temperature (RT). The staircase width does not depend strongly on nanodisk diameter, but It strongly depends on nanodisk thickness. This result suggests that the nanodisk works as a quantum-well at RT.

本文言語English
ページ(範囲)740021-740023
ページ数3
ジャーナルApplied Physics Express
1
7
DOI
出版ステータスPublished - 2008 7

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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