A new method for fabrication nano-porous aluminum grating array

研究成果: Article

12 引用 (Scopus)

抜粋

The fabrication technique of highly ordered anodic porous alumina membrane by anodization of Al and the obtained membrane as a mask to the fabrication of 100 run period antireflection grating hole are described. The two-step anodizing process improves the quality of the nanohole because the periodic seeds are generated by the first anodization. Antireflection grating structures are fabricated by using ordered anodic porous alumina mask and etched by SF 6 fast atom beam on silicon wafer. The reflectivity of the antireflection grating structures is measured and compared with that of the calculated value and the polished silicon surface.

元の言語English
ページ(範囲)272-274
ページ数3
ジャーナルMicrosystem Technologies
10
発行部数4
DOI
出版物ステータスPublished - 2004 5 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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