A high sensitivity and compact real time gas concentration sensor for semiconductor and electronic device manufacturing process

Hidekazu Ishii, Masaaki Nagase, Nobukazu Ikeda, Yoshinobu Shiba, Yasuyuki Shirai, Rihito Kuroda, Shigetoshi Sugawa

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

We have been studying in-line gas concentration sensor units for various metal-organic(MO) gases used in electronic device manufacturing process. MO gases are low vapor pressure and are generally supplied by bubbling. At the time of bubbling supply, concentration control is performed by internal pressure control and feedback control by in-line gas concentration sensor units for concentration correction due to lowering of the liquid level inside the MO tank. We have evaluated a high sensitivity in-line gas concentration sensor that adopts ultraviolet absorption method and charge amplifier detection circuit and demonstrated that it is a unit with high response speed of 400 msec or less and high detection sensitivity. In this report, we confirmed that it is possible to measure the concentration of Zr, Hf type MO gas used for semiconductor gate insulating film.

本文言語English
ホスト出版物のタイトルECS Transactions
出版社IOP Publishing Ltd.
ページ1399-1405
ページ数7
13
ISBN(電子版)9781510866171, 9781510866171, 9781510866171, 9781607688280, 9781607688303, 9781607688310, 9781607688327, 9781607688334, 9781607688341, 9781607688358, 9781607688365, 9781607688372, 9781607688389, 9781607688396, 9781607688402, 9781607688419
DOI
出版ステータスPublished - 2018
イベント233rd Meeting of the Electrochemical Society - Seattle, United States
継続期間: 2018 5月 132018 5月 17

出版物シリーズ

名前ECS Transactions
番号13
85
ISSN(印刷版)1938-6737
ISSN(電子版)1938-5862

Conference

Conference233rd Meeting of the Electrochemical Society
国/地域United States
CitySeattle
Period18/5/1318/5/17

ASJC Scopus subject areas

  • 工学(全般)

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