A CPU on a glass substrate using CG-silicon TFTs

Buyeol Lee, Yasuhiro Hirayama, Yasushi Kubota, Shigeki Imai, Akihiko Imaya, Mikio Katayama, Kiyoshi Kato, Akira Ishikawa, Takayuki Ikeda, Yoshiyuki Kurokawa, Tadafumi Ozaki, Kohei Mutaguch, Shumpei Yamazaki

研究成果: Conference article査読

36 被引用数 (Scopus)


A CPU is produced on a glass substrate using continuous-gain silicon TFTs. Corning 1737 glass with a distortion point of 640°C forms the glass substrate and the process temperature never exceeds 550°C. The 8b CPU contains 13,000 TFTs and the chip area is 13 × 13mm2. Operation at a frequency of 3MHz was confirmed at 5V.

ジャーナルDigest of Technical Papers - IEEE International Solid-State Circuits Conference
出版ステータスPublished - 2003
イベント2003 Digest of Technical Papers - , United States
継続期間: 2003 2 92003 2 13

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学


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