(0 0 6)-oriented α-Al2O3 films prepared in CO2-H2 atmosphere by laser chemical vapor deposition using a diode laser

Yu You; Akihiko Ito; Rong Tu; Takashi Goto

doi:10.1016/j.mseb.2011.05.030

(0 0 6)-oriented α-Al₂O₃ films prepared in CO₂-H₂ atmosphere by laser chemical vapor deposition using a diode laser

Yu You, Akihiko Ito, Rong Tu, Takashi Goto

金属材料研究所・材料プロセス・評価研究部

研究成果: Article › 査読

2 被引用数 (Scopus)

抄録

(0 0 6)-oriented α-Al₂O₃ films were prepared by laser chemical vapor deposition (LCVD) using aluminum acetylacetonate (Al(acac)₃) in CO₂-H₂ atmosphere. The effects of the CO₂ mole fraction (FCO₂) and laser power (P _L) on the crystal phase, microstructure, and deposition rate (R _dep) were investigated. α- and γ-Al₂O ₃ mixture films were prepared at P_L = 90 W (deposition temperature of 818 K), whereas (0 0 6)-oriented single-phase α-Al ₂O₃ films were obtained at P_L = 110 W (863 K). The texture coefficient and the grain size of the (0 0 6)-oriented films increased with increasing FCO₂. The orientation of the α-Al₂O₃ films changed from (0 0 6) to (1 0 4) to (0 1 2) with increasing P_L (T_dep). The R_dep of the (0 0 6)-oriented α-Al₂O₃ films increased with increasing FCO₂.

本文言語	English
ページ（範囲）	984-989
ページ数	6
ジャーナル	Materials Science and Engineering B: Solid-State Materials for Advanced Technology
巻	176
号	13
DOI	https://doi.org/10.1016/j.mseb.2011.05.030
出版ステータス	Published - 2011 8 15

ASJC Scopus subject areas

材料科学（全般）
凝縮系物理学
材料力学
機械工学

文献へのアクセス

10.1016/j.mseb.2011.05.030

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引用スタイル

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title = "(0 0 6)-oriented α-Al2O3 films prepared in CO2-H2 atmosphere by laser chemical vapor deposition using a diode laser",

abstract = "(0 0 6)-oriented α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) using aluminum acetylacetonate (Al(acac)3) in CO2-H2 atmosphere. The effects of the CO2 mole fraction (FCO2) and laser power (P L) on the crystal phase, microstructure, and deposition rate (R dep) were investigated. α- and γ-Al2O 3 mixture films were prepared at PL = 90 W (deposition temperature of 818 K), whereas (0 0 6)-oriented single-phase α-Al 2O3 films were obtained at PL = 110 W (863 K). The texture coefficient and the grain size of the (0 0 6)-oriented films increased with increasing FCO2. The orientation of the α-Al2O3 films changed from (0 0 6) to (1 0 4) to (0 1 2) with increasing PL (Tdep). The Rdep of the (0 0 6)-oriented α-Al2O3 films increased with increasing FCO2.",

keywords = "Laser CVD, α-AlO, Morphology, c-Axis growth",

author = "Yu You and Akihiko Ito and Rong Tu and Takashi Goto",

note = "Funding Information: This study was supported in part by the Global COE Program of Materials Integration , Tohoku University. It was also performed as part of the Rare Metal Substitute Materials Development Project of the New Energy and Industrial Technology Development Organization (NEDO). This research was also supported in part by the Japan Society for the Promotion of Science , Grant-in-Aid for Young Scientists (B), No. 22760550, and by the Ministry of Edu cation, Science, Sports and Technology, Grant-in-Aid f or Scientific Research (A), No. 22246082.",

year = "2011",

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doi = "10.1016/j.mseb.2011.05.030",

language = "English",

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T1 - (0 0 6)-oriented α-Al2O3 films prepared in CO2-H2 atmosphere by laser chemical vapor deposition using a diode laser

AU - You, Yu

AU - Ito, Akihiko

AU - Tu, Rong

AU - Goto, Takashi

N1 - Funding Information: This study was supported in part by the Global COE Program of Materials Integration , Tohoku University. It was also performed as part of the Rare Metal Substitute Materials Development Project of the New Energy and Industrial Technology Development Organization (NEDO). This research was also supported in part by the Japan Society for the Promotion of Science , Grant-in-Aid for Young Scientists (B), No. 22760550, and by the Ministry of Edu cation, Science, Sports and Technology, Grant-in-Aid f or Scientific Research (A), No. 22246082.

PY - 2011/8/15

Y1 - 2011/8/15

N2 - (0 0 6)-oriented α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) using aluminum acetylacetonate (Al(acac)3) in CO2-H2 atmosphere. The effects of the CO2 mole fraction (FCO2) and laser power (P L) on the crystal phase, microstructure, and deposition rate (R dep) were investigated. α- and γ-Al2O 3 mixture films were prepared at PL = 90 W (deposition temperature of 818 K), whereas (0 0 6)-oriented single-phase α-Al 2O3 films were obtained at PL = 110 W (863 K). The texture coefficient and the grain size of the (0 0 6)-oriented films increased with increasing FCO2. The orientation of the α-Al2O3 films changed from (0 0 6) to (1 0 4) to (0 1 2) with increasing PL (Tdep). The Rdep of the (0 0 6)-oriented α-Al2O3 films increased with increasing FCO2.

AB - (0 0 6)-oriented α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) using aluminum acetylacetonate (Al(acac)3) in CO2-H2 atmosphere. The effects of the CO2 mole fraction (FCO2) and laser power (P L) on the crystal phase, microstructure, and deposition rate (R dep) were investigated. α- and γ-Al2O 3 mixture films were prepared at PL = 90 W (deposition temperature of 818 K), whereas (0 0 6)-oriented single-phase α-Al 2O3 films were obtained at PL = 110 W (863 K). The texture coefficient and the grain size of the (0 0 6)-oriented films increased with increasing FCO2. The orientation of the α-Al2O3 films changed from (0 0 6) to (1 0 4) to (0 1 2) with increasing PL (Tdep). The Rdep of the (0 0 6)-oriented α-Al2O3 films increased with increasing FCO2.

KW - Laser CVD, α-AlO

KW - Morphology

KW - c-Axis growth

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