Abstract
The strength of single- and polycrystalline ZnSe was investigated at elevated temperatures by means of compressive deformation. The yield stress of ZnSe was rather low around 13 MPa, easily deformed even at low temperatures 150 °C. The activation energy for dislocation motion in ZnSe was estimated to be 0.5-0.7 eV. The intrinsic stacking fault energy was measured 7-9 mJ/m 2 from the dissociation width ∼20 nm of dislocations into partials by weak-beam transmission electron microscopy. The recombination-enhanced dislocation motion was detected through the change of dislocation morphologies induced by the electron irradiation during weak-beam observation.
Original language | English |
---|---|
Pages (from-to) | 771-774 |
Number of pages | 4 |
Journal | Physica B: Condensed Matter |
Volume | 376-377 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2006 Apr 1 |
Externally published | Yes |
Event | Proceedings of the 23rd International Conference on Defects in Semiconductors - Duration: 2005 Jul 24 → 2005 Jul 29 |
Keywords
- Dislocation mobility
- Dissociation
- Electronic excitation
- Zinc selenide
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering