YAG laser-assisted etching of silicon for fabricating sensors and actuators

Kazuyuki Minami; Yuji Wakabayashi; Masayuki Yoshida; Kohsel Watanabe; Masayoshi Esashi

doi:10.1088/0960-1317/3/2/008

YAG laser-assisted etching of silicon for fabricating sensors and actuators

Kazuyuki Minami, Yuji Wakabayashi, Masayuki Yoshida, Kohsel Watanabe, Masayoshi Esashi

Micro System Integration Center (μSIC)

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

YAG laser-assisted etching techniques were developed and investigated for releasing silicon microstructures. Gases, including HCI, SF_e and NF₃ were used for silicon etching. These produce volatile exhaust at atmospheric pressure. yag laser-assisted etching was applied to fabricate an electrostatic micraactualor, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.

Original language	English
Pages (from-to)	81-86
Number of pages	6
Journal	Journal of Micromechanics and Microengineering
Volume	3
Issue number	2
DOIs	https://doi.org/10.1088/0960-1317/3/2/008
Publication status	Published - 1993 Jan 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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10.1088/0960-1317/3/2/008

Cite this

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title = "YAG laser-assisted etching of silicon for fabricating sensors and actuators",

abstract = "YAG laser-assisted etching techniques were developed and investigated for releasing silicon microstructures. Gases, including HCI, SFe and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. yag laser-assisted etching was applied to fabricate an electrostatic micraactualor, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.",

author = "Kazuyuki Minami and Yuji Wakabayashi and Masayuki Yoshida and Kohsel Watanabe and Masayoshi Esashi",

year = "1993",

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T1 - YAG laser-assisted etching of silicon for fabricating sensors and actuators

AU - Minami, Kazuyuki

AU - Wakabayashi, Yuji

AU - Yoshida, Masayuki

AU - Watanabe, Kohsel

AU - Esashi, Masayoshi

PY - 1993/1/1

Y1 - 1993/1/1

N2 - YAG laser-assisted etching techniques were developed and investigated for releasing silicon microstructures. Gases, including HCI, SFe and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. yag laser-assisted etching was applied to fabricate an electrostatic micraactualor, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.

AB - YAG laser-assisted etching techniques were developed and investigated for releasing silicon microstructures. Gases, including HCI, SFe and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. yag laser-assisted etching was applied to fabricate an electrostatic micraactualor, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.

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ER -

YAG laser-assisted etching of silicon for fabricating sensors and actuators

Abstract

ASJC Scopus subject areas

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