YAG laser-assisted etching techniques were developed and investigated for releasing silicon microstructures. Gases, including HCI, SFe and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. yag laser-assisted etching was applied to fabricate an electrostatic micraactualor, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials
- Mechanical Engineering
- Electrical and Electronic Engineering