YAG laser-assisted etching of silicon for fabricating sensors and actuators

Kazuyuki Minami, Yuji Wakabayashi, Masayuki Yoshida, Kohsel Watanabe, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

YAG laser-assisted etching techniques were developed and investigated for releasing silicon microstructures. Gases, including HCI, SFe and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. yag laser-assisted etching was applied to fabricate an electrostatic micraactualor, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.

Original languageEnglish
Pages (from-to)81-86
Number of pages6
JournalJournal of Micromechanics and Microengineering
Volume3
Issue number2
DOIs
Publication statusPublished - 1993 Jan 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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