X-ray production by channeled ions

M. Ohura, K. Ozawa, J. H. Chang, Y. Yamamoto, S. Morita, K. Ishii

Research output: Contribution to journalArticlepeer-review

Abstract

RBS and X-ray spectra have been measured for random and aligned (parallel to 〈100〉 axis) orientation of Si crystals and SOS (silicon on sapphire) crystals of 4000 Å thick Si. The projectile energy has been changed over the ranges 0.5-2.0 MeV for protons and 0.25-0.6 MeV/amu for α particles. The ratio of X-ray counts of the aligned case to those of the random case is shown as a function of projectile energy separately for Si K X-rays and continuum bremsstrahlung. The impact-parameter dependence of ion-atom collisions for producing these X-rays is discussed.

Original languageEnglish
Pages (from-to)137-140
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, A
Volume262
Issue number1
DOIs
Publication statusPublished - 1987 Dec 1

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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