X-ray photoelectron spectroscopy study on dielectric properties at gate insulator film/Si interfaces

K. Hirose, H. Nohira, D. Kobayashi, T. Hattori

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    We propose a new method to estimate the local dielectric constant of an ultrathin gate insulator film formed on Si substrates by using X-ray photoelectron spectroscopy (XPS). First we measure the difference of core-level binding energy shifts for Si Is and Si 2p, ΔE1s - ΔE 2p, for various Si compounds using high-resolution high-energy synchrotron radiation. We find that the ΔE1s - ΔE 2p values are in very good correlation with the dielectric constant values of the Si compounds. Then, using this relation, we deduce the local dielectric constant for ultrathin SiO2 film formed on Si substrates. The results are in good agreement with values predicted by a first-principles calculation.

    Original languageEnglish
    Title of host publicationICSICT-2006
    Subtitle of host publication2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
    PublisherIEEE Computer Society
    Pages368-371
    Number of pages4
    ISBN (Print)1424401615, 9781424401611
    DOIs
    Publication statusPublished - 2006 Jan 1
    EventICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology - Shanghai, China
    Duration: 2006 Oct 232006 Oct 26

    Publication series

    NameICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings

    Other

    OtherICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology
    CountryChina
    CityShanghai
    Period06/10/2306/10/26

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering

    Fingerprint Dive into the research topics of 'X-ray photoelectron spectroscopy study on dielectric properties at gate insulator film/Si interfaces'. Together they form a unique fingerprint.

    Cite this