X-ray photoelectron spectroscopic study on initial oxidation of hafnium hydride fractured in an ultra-high vacuum

Naofumi Ohtsu, Bun Tsuchiya, Masaoki Oku, Tatsuo Shikama, Kazuaki Wagatsuma

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

The initial oxidation of hafnium hydride was studied by X-ray photoelectron spectroscopy (XPS). The clean surface of hafnium hydride was obtained by fracturing the specimen in an XPS measurement chamber under a background pressure of 2.7 × 10 -6 Pa. The fractured surface was oxidized in situ with the exposure to high-purity oxygen and the residual gases in an ultra-high vacuum chamber. The XPS spectra for the oxidized surfaces had the shoulder due to the oxidation, and the shoulder grew up with increase in exposure time even in the ultra-high vacuum. The factor analysis for the XPS spectra of the oxidized surface showed that the oxide formed in the chamber consists of only the hafnium dioxide, and no suboxide states are contained. The result corresponded to the oxide observed on hafnium hydride fractured in air.

Original languageEnglish
Pages (from-to)6844-6847
Number of pages4
JournalApplied Surface Science
Volume253
Issue number16
DOIs
Publication statusPublished - 2007 Jun 15

Keywords

  • Factor analysis
  • Fracturing
  • Hafnium hydride
  • Initial oxidation
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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