A high-aspect-ratio absorption grating with a pitch of several μm is a key component of X-ray grating interferometery, which is an X-ray phase imaging technique that allows for highly sensitive X-ray imaging with a compact laboratory X-ray source. Here, we report that X-ray phase imaging was successfully performed at 15 keV by using a 23 ± 1-μm-height, 9-μm-pitch absorption grating (10 × 10mm2) based on Gd (Gd60Cu25Al15) fabricated by a metallic glass imprinting technique. The imprinting technique is cost-efficient and has a high-production rate, and will be widely used for fabricating gratings not only for X-rays but also neutrons in the near future.
ASJC Scopus subject areas
- Physics and Astronomy(all)