X-ray phase imaging using a Gd-based absorption grating fabricated by imprinting technique

Wataru Yashiro, Kosuke Kato, Maryam Sadeghilaridjani, Atsushi Momose, Takenao Shinohara, Hidemi Kato

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A high-aspect-ratio absorption grating with a pitch of several μm is a key component of X-ray grating interferometery, which is an X-ray phase imaging technique that allows for highly sensitive X-ray imaging with a compact laboratory X-ray source. Here, we report that X-ray phase imaging was successfully performed at 15 keV by using a 23 ± 1-μm-height, 9-μm-pitch absorption grating (10 × 10mm2) based on Gd (Gd60Cu25Al15) fabricated by a metallic glass imprinting technique. The imprinting technique is cost-efficient and has a high-production rate, and will be widely used for fabricating gratings not only for X-rays but also neutrons in the near future.

Original languageEnglish
Article number048003
JournalJapanese journal of applied physics
Volume55
Issue number4
DOIs
Publication statusPublished - 2016 Apr

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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