X-ray diffraction and X-ray photoelectron spectra of Fe-Cr-N films deposited by DC reactive sputtering

D. L. Peng, K. Sumiyama, M. Oku, T. J. Konno, K. Wagatsuma, K. Suzuki

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

The effects of nitrogen flow ratio, target area ratio of Cr, and substrate temperature on the structure of DC reactive sputtered Fe-Cr-N ternary films have been studied. X-ray diffraction measurements show that Fe-Cr-N films consist of α-Fe(Cr) and γ′-(Fe,Cr)4Nx (x < 1) phases. The crystal grain of the α-Fe(Cr) phase becomes finer and a (200) texture of the γ′-(Fe,Cr)4Nx phase becomes more marked with increasing the nitrogen flow ratio. X-ray photoelectron spectra of the films show that oxidation resistance of Fe-Cr-N films is superior to that of Fe-N films, and oxides are formed only in the film surface due to contacting with the ambient atmosphere and oxygen contamination is very small in the inner parts of these films.

Original languageEnglish
Pages (from-to)4623-4628
Number of pages6
JournalJournal of Materials Science
Volume34
Issue number18
DOIs
Publication statusPublished - 1999 Jan 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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