Abstract
Writing performance of a shielded planar head with an ion-beam-fabricated main pole was estimated. Magnetic field simulation based on an ion-beam-etched Fe-Co film profile revealed that the two-or three-step-tapered main pole structure, which is one of characteristic configurations of the ion-beam process, has high writing and fabricating potential compared with that of the silicon template process. Especially, the three-step-tapered main pole shows not only high field strength (15 kOe) and field gradient (500 Oe/nm) but also wellsuppressed fringing field. The shielded planar head with the ion-beam-milling-processed main pole is one of the leading candidates for application as a writer in the era of Tbpsi recording.
Original language | English |
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Pages (from-to) | 3613-3616 |
Number of pages | 4 |
Journal | IEEE Transactions on Magnetics |
Volume | 44 |
Issue number | 11 PART 2 |
DOIs | |
Publication status | Published - 2008 Nov |
Keywords
- Magnetic fields
- Magnetic heads
- Perpendicular magnetic recording
- Writing
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering