Writing performance of a planar single-pole head with a main pole fabricated by ion-beam milling

Yuichi Ohsawa, Kiyoshi Yamakawa, Hiroaki Muraoka

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Writing performance of a shielded planar head with an ion-beam-fabricated main pole was estimated. Magnetic field simulation based on an ion-beam-etched Fe-Co film profile revealed that the two-or three-step-tapered main pole structure, which is one of characteristic configurations of the ion-beam process, has high writing and fabricating potential compared with that of the silicon template process. Especially, the three-step-tapered main pole shows not only high field strength (15 kOe) and field gradient (500 Oe/nm) but also wellsuppressed fringing field. The shielded planar head with the ion-beam-milling-processed main pole is one of the leading candidates for application as a writer in the era of Tbpsi recording.

Original languageEnglish
Pages (from-to)3613-3616
Number of pages4
JournalIEEE Transactions on Magnetics
Volume44
Issue number11 PART 2
DOIs
Publication statusPublished - 2008 Nov

Keywords

  • Magnetic fields
  • Magnetic heads
  • Perpendicular magnetic recording
  • Writing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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