Wide range reflection multilayer in 200-25 nm region for Schwarzschild objectives

T. Ejima, K. Sudo, T. Hatano, M. Watanabe

    Research output: Contribution to journalConference articlepeer-review

    Abstract

    Preliminary results of a wide range reflection multilayer in a range from 200 nm to 25 nm (6 eV to 50 eV) for normal incidence are reported. The structure of the multilayer is [SiC (6.0 nm)](top single layer)/[Y2O3(5.0 nm)/Mg(12.5 nm)/Y2O3(3.3 nm)/Mg(10.0 nm)](middle-aperiodic layers)/[Y2O3(3.0 nm)/Mg(9.9 nm)]×15 (piled-double-layers). Its normal incidence reflectance was more than 0.25 in 220 - 115 nm region and more than 0.04 in 34 - 24 nm region.

    Original languageEnglish
    Pages (from-to)259-262
    Number of pages4
    JournalJournal De Physique. IV : JP
    Volume104
    DOIs
    Publication statusPublished - 2003 Mar
    Event7th International Conference on X-Ray Microscopy - Grenoble, France
    Duration: 2002 Jul 282002 Aug 2

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

    Fingerprint

    Dive into the research topics of 'Wide range reflection multilayer in 200-25 nm region for Schwarzschild objectives'. Together they form a unique fingerprint.

    Cite this