Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region

Kanta Kusaka, Hiroyuki Kurosawa, Seigo Ohno, Yozaburo Sakaki, Kazuyuki Nakayama, Yuto Moritake, Teruya Ishihara

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region. Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask patterns for the first time. TM1 mode in the waveguide is shown to be useful for providing a three-dimensional structure whose cross section is checkerboard pattern. Applying our WMIL technique, we demonstrate 1D, 2D and 3D subwavelength resist patterns that are widely used for the fabrication of metamteterials in the visible region. In addition to the resist patterns, we demonstrate a resonance at 1.9 eV for a split tube structure experimentally.

Original languageEnglish
Pages (from-to)18748-18756
Number of pages9
JournalOptics Express
Volume22
Issue number15
DOIs
Publication statusPublished - 2014

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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