Very Thin Silicon Steel Tertiary Recrystallized by Continuous Annealing Method

M. Ohkawa, Y. H. Kim, K. Ishiyama, K. I. Arai

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

It is well known that very thin grain-oriented silicon steel sheet has a very low iron loss. A continuous annealing method was used to obtain a long (over 1 m) thin grain-oriented silicon steel sheet. As a result, thin grain-oriented silicon steel sheet 40 (inn thick and 1 m long was obtained. The annealing temperature was 1423K and the sample speed was from 0.7 to 2.1 mm/s. The annealing time needed to complete the recrystallization of (110) [001] grains was only a few minutes. However, the grain size of the sample was not uniform. As a result, the magnetic properties depend on the position of the sample.

Original languageEnglish
Pages (from-to)901-905
Number of pages5
JournalIEEE Translation Journal on Magnetics in Japan
Volume8
Issue number12
DOIs
Publication statusPublished - 1993 Dec

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Engineering(all)

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