Very high carrier mobility for high-performance CMOS on a Si(110) surface

Akinobu Teramoto, Tatsufumi Hamada, Masashi Yamamoto, Philippe Gaubert, Hiroshi Akahori, Keiichi Nii, Masaki Hirayama, Kenta Arima, Katsuyoshi Endo, Shigetoshi Sugawa, Tadahiro Ohmi

Research output: Contribution to journalArticle

73 Citations (Scopus)

Abstract

In this paper, we demonstrate CMOS characteristics on a Si(110) surface using surface flattening processes and radical oxidation. A Si(110) surface is easily roughened by OH- ions in the cleaning solution compared with a Si(100) surface. A flat Si(110) surface is realized by the combination of flattening processes, which include a high-temperature wet oxidation, a radical oxidation, and a five-step room-temperature cleaning as a pregateoxidation cleaning, which does not employ an alkali solution. On the flat surface, the current drivability of a p-channel MOSFET on a Si(110) surface is three times larger than that on a Si(100) surface, and the current drivability of an n-channel MOSFET on a Si(110) surface can be improved compared with that without the flattening processes and alkali-free cleaning. The 1/f noise of the n-channel MOSFET and p-channel MOSFET on a flattened Si(110) surface is one order of magnitude less than that of a conventional n-channel MOSFET on a Si(100) surface. Thus, a highspeed and low-flicker-noise p-channel MOSFET can be realized on a flat Si(110) surface. Furthermore, a CMOS implementation in which the current drivabilities of the p-channel and n-channel MOSFETs are balanced can be realized (balanced CMOS). These advantages are very useful in analog/digital mixed-signal circuits.

Original languageEnglish
Pages (from-to)1438-1445
Number of pages8
JournalIEEE Transactions on Electron Devices
Volume54
Issue number6
DOIs
Publication statusPublished - 2007 Jun 1

Keywords

  • CMOS
  • Channel
  • Cleaning
  • Flicker
  • MOSFET
  • Mobility
  • Noise
  • Surface orientation
  • roughness

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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  • Cite this

    Teramoto, A., Hamada, T., Yamamoto, M., Gaubert, P., Akahori, H., Nii, K., Hirayama, M., Arima, K., Endo, K., Sugawa, S., & Ohmi, T. (2007). Very high carrier mobility for high-performance CMOS on a Si(110) surface. IEEE Transactions on Electron Devices, 54(6), 1438-1445. https://doi.org/10.1109/TED.2007.896372