Due to electromigration, mechanical stress (atomic density) gradient appears in the passivated lines, and plays an important part in electromigration mechanism. Recently, a governing parameter, AFD* gen, for electromigration damage in the passivated polycrystalline lines was formulated. The formulation was carried out by adding the effect of atomic density gradient to the governing parameter, AFDgen, for electromigration damage in unpassivated polycrystalline and bamboo lines, which has been proposed and utilized to construct a method for failure prediction in these lines. In this paper, the passivated polycrystalline lines with two different lengths are treated. Both are straight shaped lines, which are made of the same Al film. But, they are different in line length. The characteristics in each line are obtained using the AFD* gen-based method for determination of film characteristics. The usefulness of AFD*gen is verified through the comparison of the film characteristics obtained for these two kinds of lines.