Variation of radial plasma density profile with the excitation frequency in a magnetron-type plasma

Sunil Wickramanayaka, Yunlong Li, Satoru Iizuka, Ken Ichi Takagi, Yukito Nakagawa, Tsutomu Tsukada, Noriyoshi Sato

Research output: Contribution to journalArticle

Abstract

The variation of the radial profile of plasma density with the excitation frequency was investigated using a magnetrontype plasma source. The plasma source is comprised of a cylindrical shaped rf electrode and two annular magnets attached to the outer surface of the rf electrode. As the excitation frequency of the plasma, 13.56 MHz, 40 MHz and 60 MHz were used. The radial profile of plasma density was observed in the downstream at 12 cm below the axial center of the rf electrode. Measurements were carried out for Ar plasma for pressures <10mTorr. The applied rf power varied from 200W to 1500W. The radial profile of the plasma density at a given distance from the axial center of the rf electrode changes with the change of excitation frequency. When the excitation frequency is 40MHz, a radially uniform plasma could be obtained 12cm below the axial center of the rf electrode. The nonuniformity of this plasma over an area of 300 mm diameter is < ±5% regardless of the applied rf power. A change of pressure slightly affects the radial uniformity of the plasma. Plasmas produced by two other frequencies show a higher nonuniformity at the same distance from the axial center.

Original languageEnglish
Pages (from-to)2035-2038
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume37
Issue number4 SUPPL. A
DOIs
Publication statusPublished - 1998 Apr

Keywords

  • Magnetron-type plasma
  • Plasma excitation frequency
  • Radial plasma uniformity

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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