TY - JOUR
T1 - Variable-energy positron annihilation study of subnanopores in SiOCH-based PECVD films
AU - Ito, Kenji
AU - Oka, Toshitaka
AU - Kobayashi, Yoshinori
AU - Suzuki, Ryoichi
AU - Ohdaira, Toshiyuki
PY - 2007/2/1
Y1 - 2007/2/1
N2 - Subnanoporosity was introduced into SiOCH-based thin films by mixing tetraethyl orthosilicate with hexamethyldisiloxane (HMDSO) in the plasma enhanced chemical vapor deposition process, and was evaluated by the variable-energy positron annihilation lifetime technique. It was found that with increasing the HMDSO fraction both porosity and pore size were enhanced, as evidenced by the decreased refractive index and increased ortho-positronium lifetime. The lifetimes from 2.0 to 6.8 ns suggested the tunable pore volumes within a range of 0.1-0.7 nm3.
AB - Subnanoporosity was introduced into SiOCH-based thin films by mixing tetraethyl orthosilicate with hexamethyldisiloxane (HMDSO) in the plasma enhanced chemical vapor deposition process, and was evaluated by the variable-energy positron annihilation lifetime technique. It was found that with increasing the HMDSO fraction both porosity and pore size were enhanced, as evidenced by the decreased refractive index and increased ortho-positronium lifetime. The lifetimes from 2.0 to 6.8 ns suggested the tunable pore volumes within a range of 0.1-0.7 nm3.
KW - Hexamethyldisiloxane
KW - PECVD
KW - Positron annihilation
KW - Subnanopore
KW - Tetraethyl orthosilicate
KW - Thin film
UR - http://www.scopus.com/inward/record.url?scp=33751167024&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33751167024&partnerID=8YFLogxK
U2 - 10.1016/j.radphyschem.2006.03.038
DO - 10.1016/j.radphyschem.2006.03.038
M3 - Article
AN - SCOPUS:33751167024
SN - 0969-806X
VL - 76
SP - 213
EP - 216
JO - Radiation Physics and Chemistry
JF - Radiation Physics and Chemistry
IS - 2
ER -