Variable-energy positron annihilation study of subnanopores in SiOCH-based PECVD films

Kenji Ito, Toshitaka Oka, Yoshinori Kobayashi, Ryoichi Suzuki, Toshiyuki Ohdaira

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

Subnanoporosity was introduced into SiOCH-based thin films by mixing tetraethyl orthosilicate with hexamethyldisiloxane (HMDSO) in the plasma enhanced chemical vapor deposition process, and was evaluated by the variable-energy positron annihilation lifetime technique. It was found that with increasing the HMDSO fraction both porosity and pore size were enhanced, as evidenced by the decreased refractive index and increased ortho-positronium lifetime. The lifetimes from 2.0 to 6.8 ns suggested the tunable pore volumes within a range of 0.1-0.7 nm3.

Original languageEnglish
Pages (from-to)213-216
Number of pages4
JournalRadiation Physics and Chemistry
Volume76
Issue number2
DOIs
Publication statusPublished - 2007 Feb 1
Externally publishedYes

Keywords

  • Hexamethyldisiloxane
  • PECVD
  • Positron annihilation
  • Subnanopore
  • Tetraethyl orthosilicate
  • Thin film

ASJC Scopus subject areas

  • Radiation

Fingerprint Dive into the research topics of 'Variable-energy positron annihilation study of subnanopores in SiOCH-based PECVD films'. Together they form a unique fingerprint.

Cite this