Using an Auger electron spectrometer to measure electron beam induced X-ray excited photoelectrons from thin films on Al and Mg substrates

Shuyo Yamamoto, Hideyuki Matsuta, Kichinosuke Hirokawa

Research output: Contribution to journalArticlepeer-review

Abstract

Measurements of the electron beam induced X-ray excited photoelectrons were performed using an Auger electron spectrometer (JEOL JAMP-7100E). When a focused electron beam is irradiated through a thin film evaporated on a substrate, the electron beam penetrates the substrate and produces characteristic X-rays to induce photoelectrons from elements in the thin film. Differentiated photoelectron spectra of Ag3d, Au4f, Bi4d, Bi4f, Cls, Mn2p, Pb4d, Pb4f and Sn3d from thin films of these elements on the Al substrate were obtained. We applied the conventional equation of XPS intensity to the intensity of electron beam induced X-ray excited photoelectrons. Quantitative analysis of Au-Ag alloys was performed by this method and the results were in good agreement with those obtained by Auger spectroscopy with the relative sensitivity factor method. When an oxidized Cu film on the magnesium substrate was measured by this method, chemical shifts and satellite peaks of the photoelectron peak that are characteristic of Cu(II) can be detected. Lateral resolution of line analysis with this method was found to be much better than that with the conventional XPS spectrometer.

Original languageEnglish
Pages (from-to)873-877
Number of pages5
JournalBUNSEKI KAGAKU
Volume45
Issue number9
DOIs
Publication statusPublished - 1996 Sep

Keywords

  • AES
  • Photoelectron
  • Thin film
  • XPS

ASJC Scopus subject areas

  • Analytical Chemistry

Fingerprint

Dive into the research topics of 'Using an Auger electron spectrometer to measure electron beam induced X-ray excited photoelectrons from thin films on Al and Mg substrates'. Together they form a unique fingerprint.

Cite this