Use of tetraethylgermane in arf excimer laser chemical vapor deposition of amorphous silicon-germanium films

Fujio Ishihara, Hiroshi Uji, Tatsuya Kamimura, Satoru Matsumoto, Hirofumi Higuchi, Shigefusa Chichibu

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy