Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes

Mitsuru Okigawa, Yasushi Ishikawa, Yoshinari Ichihashi, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

35 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy