Ultrathin polymer Langmuir-Blodgett films for microlithography

Tiesheng Li, Masaya Mitsuishi, Tokuji Miyashita

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

We describe photolithographic properties of poly(N-dodecylmethacrylamide-co-t-butyl 4-vinylphenyl carbonate) [p(DDMA-tBVPC)], which has a structure being subject to main chain scission and deprotection of t-butoxycarbonyloxy group by deep UV irradiation. Positive-tone patterns of the p(DDMA-tBVPC) Langmuir-Blodgett (LB) film with 60 layers were obtained by deep UV light irradiation followed by development with alkaline aqueous solution. The resolution of the pattern was 0.75 μm, which is the resolution limit of the photomask employed. The etching resistance of p(DDMA-tBVPC) LB film deposited for the pattern of the gold film is also investigated.

Original languageEnglish
Pages (from-to)138-142
Number of pages5
JournalThin Solid Films
Volume446
Issue number1
DOIs
Publication statusPublished - 2004 Jan 1

Keywords

  • Etching
  • Langmuir-Blodgett films
  • Photolithography
  • Polymer

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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