Ultrahigh-frequency microplasma jet as a low-power, high-density, and localized ions/radicals source

Hiroyuki Miyazoe, Masaki Sai, Sven Stauss, Kazuo Terashima

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

An ultrahigh-frequency (450 MHz) microplasma jet was stably generated at a chamber pressure as low as 10-3 Pa. Electron and gas temperatures of this microplasma as estimated by optical-emission spectroscopy measurements were ∼7000 and 1000 K, respectively. The atomic oxygen flux at the torch exit was revealed to be of the order of 1019 atoms/ cm2 s, which is 102 - 104 times higher than that obtained by other conventional plasma sources. This microplasma jet was also applied as an ion source for in situ neutralization of electron charging-up effects in a scanning-electron microscopy observation of insulating materials.

Original languageEnglish
Pages (from-to)9-12
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume27
Issue number1
DOIs
Publication statusPublished - 2009
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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