An ultrahigh-frequency (450 MHz) microplasma jet was stably generated at a chamber pressure as low as 10-3 Pa. Electron and gas temperatures of this microplasma as estimated by optical-emission spectroscopy measurements were ∼7000 and 1000 K, respectively. The atomic oxygen flux at the torch exit was revealed to be of the order of 1019 atoms/ cm2 s, which is 102 - 104 times higher than that obtained by other conventional plasma sources. This microplasma jet was also applied as an ion source for in situ neutralization of electron charging-up effects in a scanning-electron microscopy observation of insulating materials.
|Number of pages||4|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Publication status||Published - 2009|
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films