Ultra-Clean-Technology for Future Semiconductor Fabrication—Fluctuation Free Semiconductor Manufacturing—

Tadahiro Ohmi, Akinobu Teramoto

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)1144-1149
Number of pages6
JournalSeimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Volume68
Issue number9
DOIs
Publication statusPublished - 2002

Keywords

  • AlO passivation
  • fluctuation
  • noise
  • plasma process equipment
  • ultra clean technology

ASJC Scopus subject areas

  • Mechanical Engineering

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