Two distinctive relaxation times leading to kinetic behavior in configurational relaxation process

Tetsuo Mohri; Satoshi Miyagishima

doi:10.2320/matertrans1989.39.154

Two distinctive relaxation times leading to kinetic behavior in configurational relaxation process

Tetsuo Mohri, Satoshi Miyagishima

Institute for Materials Research (IMR)

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

Based on a simple theoretical model, it is demonstrated how the two different relaxation times of phonon and atomic diffusion systems drive kinetic behavior. The calculations are conducted within the framework of Cluster Variation Method on the diffuse intensity spectrum due to short range ordering during the relaxation process. It is shown that kinetic feature is emerged depending upon the competition between the external cooling and internal diffusion rates. A mathematical framework is proposed to generalize the present study.

Original language	English
Pages (from-to)	154-158
Number of pages	5
Journal	Materials Transactions, JIM
Volume	39
Issue number	1
DOIs	https://doi.org/10.2320/matertrans1989.39.154
Publication status	Published - 1998 Jan

Keywords

Atomic diffusion
Cluster variation method
Configuration thermodynamics
Path probability method
Relaxation times
Short range order diffuse intensity

ASJC Scopus subject areas

Engineering(all)

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