TY - JOUR
T1 - Two distinctive relaxation times leading to kinetic behavior in configurational relaxation process
AU - Mohri, Tetsuo
AU - Miyagishima, Satoshi
N1 - Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 1998/1
Y1 - 1998/1
N2 - Based on a simple theoretical model, it is demonstrated how the two different relaxation times of phonon and atomic diffusion systems drive kinetic behavior. The calculations are conducted within the framework of Cluster Variation Method on the diffuse intensity spectrum due to short range ordering during the relaxation process. It is shown that kinetic feature is emerged depending upon the competition between the external cooling and internal diffusion rates. A mathematical framework is proposed to generalize the present study.
AB - Based on a simple theoretical model, it is demonstrated how the two different relaxation times of phonon and atomic diffusion systems drive kinetic behavior. The calculations are conducted within the framework of Cluster Variation Method on the diffuse intensity spectrum due to short range ordering during the relaxation process. It is shown that kinetic feature is emerged depending upon the competition between the external cooling and internal diffusion rates. A mathematical framework is proposed to generalize the present study.
KW - Atomic diffusion
KW - Cluster variation method
KW - Configuration thermodynamics
KW - Path probability method
KW - Relaxation times
KW - Short range order diffuse intensity
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U2 - 10.2320/matertrans1989.39.154
DO - 10.2320/matertrans1989.39.154
M3 - Article
AN - SCOPUS:0031675805
VL - 39
SP - 154
EP - 158
JO - Materials Transactions
JF - Materials Transactions
SN - 1345-9678
IS - 1
ER -