Abstract
Based on a simple theoretical model, it is demonstrated how the two different relaxation times of phonon and atomic diffusion systems drive kinetic behavior. The calculations are conducted within the framework of Cluster Variation Method on the diffuse intensity spectrum due to short range ordering during the relaxation process. It is shown that kinetic feature is emerged depending upon the competition between the external cooling and internal diffusion rates. A mathematical framework is proposed to generalize the present study.
| Original language | English |
|---|---|
| Pages (from-to) | 154-158 |
| Number of pages | 5 |
| Journal | Materials Transactions, JIM |
| Volume | 39 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1998 Jan 1 |
Keywords
- Atomic diffusion
- Cluster variation method
- Configuration thermodynamics
- Path probability method
- Relaxation times
- Short range order diffuse intensity
ASJC Scopus subject areas
- Engineering(all)
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Mori, T., & Miyagishima, S. (1998). Two distinctive relaxation times leading to kinetic behavior in configurational relaxation process. Materials Transactions, JIM, 39(1), 154-158. https://doi.org/10.2320/matertrans1989.39.154