Tunable monocrystalline silicon grating on LSI circuit fabricated by two-step polymer bonding

T. Sasaki, T. Suzuki, H. Matsuura, K. Hane

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper shows a fabrication process and device characteristics of the tunable monocrystalline silicon grating on LSI circuit. The thin monocrystalline silicon with thickness of 260 nm was transferred on the LSI circuit, by using the two-step polymer bonding process consisting of polymer patterning and bonding, and liquid-polymer filling. Furthermore, the grating was fabricated on the LSI circuit and the actuation of the grating by serial communication with the LSI circuit was demonstrated.

Original languageEnglish
Title of host publication2016 International Conference on Optical MEMS and Nanophotonics, OMN 2016 - Proceedings
PublisherIEEE Computer Society
ISBN (Electronic)9781509010356
DOIs
Publication statusPublished - 2016 Sep 13
Event21st International Conference on Optical MEMS and Nanophotonics, OMN 2016 - Singapore, Singapore
Duration: 2016 Jul 312016 Aug 4

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
Volume2016-September
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Other

Other21st International Conference on Optical MEMS and Nanophotonics, OMN 2016
CountrySingapore
CitySingapore
Period16/7/3116/8/4

Keywords

  • LSI circuit
  • monocrystalline silicon
  • tunable grating

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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