Abstract
X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.
| Original language | English |
|---|---|
| Pages (from-to) | 519-522 |
| Number of pages | 4 |
| Journal | X-Ray Spectrometry |
| Volume | 28 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1999 Jan 1 |
ASJC Scopus subject areas
- Spectroscopy
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Cite this
Kawai, J., Sai, M., Sugimura, T., Hayashi, K., Takenaka, H., & Kitajima, Y. (1999). Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer. X-Ray Spectrometry, 28(6), 519-522. https://doi.org/10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.0.CO;2-W