Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer

Jun Kawai; Makoto Sai; Tetsuro Sugimura; Koichi Hayashi; Hisataka Takenaka; Yoshinori Kitajima

doi:10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.0.CO;2-W

Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer

Jun Kawai, Makoto Sai, Tetsuro Sugimura, Koichi Hayashi, Hisataka Takenaka, Yoshinori Kitajima

Materials Development Division

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.

Original language	English
Pages (from-to)	519-522
Number of pages	4
Journal	X-Ray Spectrometry
Volume	28
Issue number	6
DOIs	https://doi.org/10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.0.CO;2-W
Publication status	Published - 1999 Jan 1

ASJC Scopus subject areas

Spectroscopy

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10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.0.CO;2-W

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title = "Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer",

abstract = "X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.",

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year = "1999",

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T1 - Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer

AU - Kawai, Jun

AU - Sai, Makoto

AU - Sugimura, Tetsuro

AU - Hayashi, Koichi

AU - Takenaka, Hisataka

AU - Kitajima, Yoshinori

PY - 1999/1/1

Y1 - 1999/1/1

N2 - X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.

AB - X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.

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Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer

Abstract

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