X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.
|Number of pages||4|
|Publication status||Published - 1999 Jan 1|
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