Total Reflection X-Ray Photoelectron Spectroscopy of a Tantalum-Titanium Multilayer

Jun Kawai, Makoto Sai, Tetsuro Sugimura, Koichi Hayashi, Hisataka Takenaka, Yoshinori Kitajima

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.

Original languageEnglish
Pages (from-to)519-522
Number of pages4
JournalX-Ray Spectrometry
Issue number6
Publication statusPublished - 1999 Jan 1

ASJC Scopus subject areas

  • Spectroscopy


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