Abstract
X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.
Original language | English |
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Pages (from-to) | 519-522 |
Number of pages | 4 |
Journal | X-Ray Spectrometry |
Volume | 28 |
Issue number | 6 |
DOIs | |
Publication status | Published - 1999 Jan 1 |
ASJC Scopus subject areas
- Spectroscopy