Total reflection x-ray excited photoelectron spectra of copper phthalocyanine thin layer on Si wafer

Jun Kawai, Shin'Ichi Kawato, Kouichi Hayashi, Toshihisa Horiuchi, Kazumi Matsushige, Yoshinori Kitajima

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19 Citations (Scopus)

Abstract

Photoelectron spectra of a Si wafer, on which copper phthalocyanine was evaporated with a thickness of 50 Å, were measured using grazing incidence x rays under a total reflection condition. It was observed that the backgrounds owing to inelastic electron scattering in solids were reduced. It was also observed that the substrate Si signal was removed and that surface signal was enhanced due to the total x-ray reflection. Oxygen depth was determined using the angle dependence of the x-ray photoelectron spectral intensity.

Original languageEnglish
Pages (from-to)3889
Number of pages1
JournalApplied Physics Letters
Volume67
DOIs
Publication statusPublished - 1995

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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