Top layer's thickness dependence on total electron-yield X-ray standing-wave

Takeo Ejima, Atsushi Yamazaki, Takanori Banse, Tadashi Hatano

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.

Original languageEnglish
Pages (from-to)897-899
Number of pages3
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume144-147
DOIs
Publication statusPublished - 2005 Jun

Keywords

  • Multilayer
  • Standing wave
  • TEY-XSW
  • Thickness
  • Total electron yield

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

Fingerprint Dive into the research topics of 'Top layer's thickness dependence on total electron-yield X-ray standing-wave'. Together they form a unique fingerprint.

Cite this