TiN/W/La2O3/Si high-k gate stack for EOT below 0.5nm

P. Ahmet, D. Kitayama, T. Kaneda, T. Suzuki, T. Koyanagi, M. Kouda, M. Mamatrishat, T. Kawanago, K. Kakushima, K. Tsutsui, A. Nishiyama, N. Sugii, K. Natori, T. Hattori, H. Iwai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science