Time variation of plasma properties in a pulse-time-modulated electron cyclotron resonance discharge of chlorine gas

Tetsu Mieno, Seiji Samukawa

Research output: Contribution to journalArticle

30 Citations (Scopus)

Abstract

Time dependence of plasma parameters in a pulse-time-modulated electron cyclotron resonance plasma of Cl2 and Ar gases is measured. It is found that Cl2 plasma produces a large quantity of negative ions during afterglow and that decay times of electron density, electron temperature and sheath potential of Cl2 plasma are much smaller than those of Ar plasma. The results suggest that the pulse modulation of Cl2 plasma changes the flow of charged particles through the sheath region to the substrate surface and enables us to improve highly selective and charge-free poly-Si patterning.

Original languageEnglish
Pages (from-to)L1079-L1082
JournalJapanese journal of applied physics
Volume34
Issue number8
DOIs
Publication statusPublished - 1995 Aug
Externally publishedYes

Keywords

  • Afterglow plasma
  • Boxcar integration method
  • Chlorine gas discharge
  • Electron cyclotron resonance discharge
  • Improvement of plasma etching
  • Langmuir probe
  • Production of negative ions
  • Pulse-time-modulated ECR plasma
  • Time-resolved measurement

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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