TY - JOUR
T1 - Time-of-flight mass spectrometry diagnostics in deep oscillation magnetron sputtering (DOMS) of titanium
AU - Sanekata, Masaomi
AU - Nakagomi, Yuki
AU - Hirayama, Mutsuki
AU - Nishida, Hiroshi
AU - Nishimiya, Nobuo
AU - Tona, Masahide
AU - Yamamoto, Hiroaki
AU - Tsukamoto, Keizo
AU - Fuke, Kiyokazu
AU - Ohshimo, Keijiro
AU - Koyasu, Kiichirou
AU - Misaizu, Fuminori
N1 - Funding Information:
The present study was supported by the Manufacturing Enterprise Promotion Business Grants-in-Aid for Research and Development 2019 (Grant No. 65-2) and 2020 (Grant No. 65-1) from Anjo City, Japan; the New Aichi Creative Research and Development Grants for 2017 (Grant No. 118–9), 2018 (Grant No. 122-10), and 2021 (Grant No. 167-9) from Aichi Prefecture, Japan; and a Grant-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (JSPS) 2021 (Grant No. 21K03503).
Publisher Copyright:
© 2022 Author(s).
PY - 2022/6/28
Y1 - 2022/6/28
N2 - Reflectron-type time-of-flight mass spectrometry was applied to the time-resolved component analysis of deep oscillation magnetron sputtering (DOMS), which has been developed as a technique of modulated pulsed magnetron sputtering. In the present study, the DOMS of a Ti target was performed under an Ar gas atmosphere by using a DOMS-specific control waveform consisting of 25 current and/or power pulses. The time evolution of the formation of ionized species (Ar+, Ar2+, Ti+, and Ti2+) after the application of the first discharge pulse was observed at the position corresponding to the deposition region. This study revealed that the plasma build-up process from non-metallic plasma to metallic plasma takes approximately two micropulses (around 100 μs from ignition) in DOMS discharge. In addition, we have found the possibility of studying sputtering processes, such as the rarefaction, and refilling processes of Ar as a function of pulse number through DOMS research.
AB - Reflectron-type time-of-flight mass spectrometry was applied to the time-resolved component analysis of deep oscillation magnetron sputtering (DOMS), which has been developed as a technique of modulated pulsed magnetron sputtering. In the present study, the DOMS of a Ti target was performed under an Ar gas atmosphere by using a DOMS-specific control waveform consisting of 25 current and/or power pulses. The time evolution of the formation of ionized species (Ar+, Ar2+, Ti+, and Ti2+) after the application of the first discharge pulse was observed at the position corresponding to the deposition region. This study revealed that the plasma build-up process from non-metallic plasma to metallic plasma takes approximately two micropulses (around 100 μs from ignition) in DOMS discharge. In addition, we have found the possibility of studying sputtering processes, such as the rarefaction, and refilling processes of Ar as a function of pulse number through DOMS research.
UR - http://www.scopus.com/inward/record.url?scp=85133090130&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85133090130&partnerID=8YFLogxK
U2 - 10.1063/5.0089592
DO - 10.1063/5.0089592
M3 - Article
AN - SCOPUS:85133090130
SN - 0021-8979
VL - 131
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 24
M1 - 243301
ER -