Tilt-insensitive film thickness measurement using a double twin-path interferometer

K. Hane, K. Yoneda, S. Hattori

Research output: Contribution to journalArticlepeer-review

Abstract

A lock-in amplifier detection method for measuring the film thickness on a flat substrate has been developed by using a common-path interferometer. The signal due to the film thickness has been obtained without it being affected by the tilting of the substrate. The sensitivity was better than 0.5 nm.

Original languageEnglish
Pages (from-to)208-212
Number of pages5
JournalOptics and Laser Technology
Volume17
Issue number4
DOIs
Publication statusPublished - 1985 Aug
Externally publishedYes

Keywords

  • interferometry
  • thickness measurement
  • thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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