Three-dimensionally controlled ion milling for reflection phase manipulation of EUV multilayer mirrors

T. Tsuru, Tadashi Hatano, M. Yamamoto

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

    Abstract

    For accurate nm-figure error correction of EUV multilayer mirror optics, a three-dimensionally controlled ion milling method was developed. To demonstrate the reflection phase manipulation of an EUV multilayer, 10 periods of a 40-period Mo/Si multilayer were partially removed. A partially milled Mo/Si multilayer with a contact double slit was successfully fabricated for interference fringe observations, which were carried out using a Young's EUV interferometer with a reflection configuration. The fringe pattern revealed a small reflection phase change after multilayer surface milling. EUV interferometry results demonstrated the effectiveness of the proposed method for sub-nanometer digital wavefront error correction in the case of multilayer mirror optics used in diffraction-limited imaging.

    Original languageEnglish
    Title of host publication10th International Conference on X-Ray Microscopy
    Pages180-183
    Number of pages4
    DOIs
    Publication statusPublished - 2010 Dec 1
    Event10th International Conference on X-Ray Microscopy - Chicago, IL, United States
    Duration: 2010 Aug 152010 Aug 20

    Publication series

    NameAIP Conference Proceedings
    Volume1365
    ISSN (Print)0094-243X
    ISSN (Electronic)1551-7616

    Other

    Other10th International Conference on X-Ray Microscopy
    Country/TerritoryUnited States
    CityChicago, IL
    Period10/8/1510/8/20

    Keywords

    • EUV multilayer
    • ion milling
    • phase correction
    • wavefront error

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

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